|
|
Plenary
Session
|
|
|
|
| Joanna
Aizenberg |
Harvard
University |
New
nanofabrication strategies: Inspired by biomineralization |
| Arthur
J. Nozik |
NREL |
Third
Generation Solar Photon Conversion Based on Multiple Exciton
Generation in Semiconductor Quantum Dots |
| Philip
Kim |
Columbia
University |
Toward
Carbon Based Electronics: Graphene, a New Opportunity |
| Michelle
Simmons |
University
of New South Wales |
Engineered
Materials for Single Atom Architectures for Computation |
| Tom
Albrecht |
Hitachi
Global Storage Technologies |
Patterned
Media |
|
|
|
|
|
LER/Resists
|
| |
|
|
| Vivek
Prabhu, Shuhui Kang, Kristopher Lavery, Eric Lin, Wen-li
Wu and Sushil Satija |
NIST |
Advances
in neutron research methods for photoresists fundamentals |
| Yehiel
Gotkis |
Sr.
Principal Eng., KLA-Tencor Corp. San Jose, CA, USA |
Interfacial
Mesoscopic Structuring As a Highly Probable Origin of the
Mysterious “LER Fundamental Limit“ |
| Takahiro
Kozawa, Seiichi Tagawa, Julius Joseph Santillan and Toshiro
Itani |
Osaka
University |
Latent
image formation in chemically amplified extreme ultraviolet
resists with low activation energy for deprotection reaction |
|
|
|
|
|
Nano-optic
devices I
|
| |
|
|
| Vladimir
Stojanovic, Rajeev Ram |
MIT |
The
Challenge of CMOS Photonics and Electronics for Enhanced
Microprocessor Performance |
| Tymon
Barwicz, Milos Popovic, Charles Holzwarth, Michael Watts,
Peter Rakich, Fuwan Gan, Marcus Dahlem, Franz Kaertner,
Erich Ippen and Henry Smith |
IBM
T.J. Watson Research Center |
Challenges
in nanofabrication of strong-confinement photonic devices |
| Isaak
Mayergoyz |
University
of Maryland |
Eigen
Mode Analysis of Plasmon Resonances in Nanoparticles |
| Baoquan
Ding, Stefano Cabrini, Ronald Zuckermann and Jeff Bokor |
Molecular
Foundry, Lawrence Berkeley National Lab |
DNA
Directed Assembly of Nanoparticles Linear Structure For
Nanophotonics * |
|
|
|
|
|
Nanopatterning
and Energy
|
| |
|
|
| Vladimir
Bulovic |
Massachusetts
Institute of Technology |
Nanostructured
Optoelectronics |
| Harry
Attwater |
Cal
Tech |
New
Approaches to Nanostructured Solar Energy Conversion Devices |
|
|
|
|
|
Electron-Beam
|
| |
|
|
| Hyo-Sung
Lee, Byung-Sung Kim, Hyun-Mi Kim, Jung-Sub Wi, Sung-Wook
Nam, Ki-Bum Kim and Yoshihiro Arai |
Seoul
National University |
Electron
beam projection nanopatterning using crystal lattice images
obtained from high resolution transmission electron microscopy |
|
|
|
|
|
Optical
Mix I
|
| |
|
|
| Richard
Blaikie |
University
of Canterbury, New Zealand |
Silver
Superlenses for Near-field Optical Nanolithography |
| Richard
Schenker, Srinivas Bollepalli, Wai Kwok, Eric Frendberg
and Yan Borodovsky |
Intel |
Advanced
Imaging via Pixelated Phase Masks and Inverse Lithography |
| Dario
Gil, Jaione Tirapu Azpiroz, Alan E. Rosenbluth, Scott Mansfield |
IBM
T. J. Watson Research Center |
The
Role of Computational Modeling in Semiconductor Lithography.Progressing
Towards the Virtual Fab |
|
|
|
|
|
Nanoimprint
I
|
| |
|
|
| Patrick
Lunsford and Xing Cheng |
Texas
A&M University |
Stability
of Self-Assembled Monolayer Surfactant Coating in Thermal
Nanoimprint |
| Mark
Schvartzman, Christopher Jahnes and Shalom Wind |
Columbia
University |
Fluorinated
Diamond-Like Carbon Templates for High Resolution Nanoimprint
Lithography * |
|
|
|
|
|
Ion
Beam |
| John
Notte, Sybren Sijbrandij, Nicholas Economou and Bill Ward |
Carl
Zeiss, SMT |
Elemental
Analysis with the Helium Ion Microscope * |
|
|
|
|
|
Metamaterials
|
| |
|
|
| Henri
Lezec |
NIST |
Nanophotonics |
|
|
|
|
|
Diblock
Copolymers
|
| |
|
|
| C.A.
Ross, Y.S. Jung, V.P. Chuang and F. Ilievski |
MIT |
Si-containing
block copolymers for self-assembled nanolithography applications |
|
|
|
|
|
Cell
Pattern Interactions
|
| |
|
|
| Nicoli
Gaataard |
University
of Glasgow |
Cell
pattern Pattern Interactions |
| Maria-Elena
Vlachopoulou, Panagiota Petrou, Sotirios Kakabakos, Angeliki
Tserepi and Evangelos Gogolides |
Institute
of Microelectronics, NCSR "Demokritos", PO Box
60228,Aghia Paraskevi,Attiki, 153 10 Greece |
High-Aspect-Ratio
Plasma-Induced Nanotexturing of Polymers (PDMS,
PMMA, PEEK, ...) for protein adsorption applications * |
|
|
|
|
|
Metrology,
Alignment & Inspection
|
| |
|
|
| Mark
McCord |
KLA-Tencor |
Electron
beam inspection of in-process semiconductor wafers: How,
Why, and What’s next? |
|
|
|
|
|
Imaging
& Microscopy
|
| |
|
|
| Ivo
Rangelow |
Department
on Micro-, and Nano-electronical Systems, |
Scanning
Proximal Probes for Parallel Imaging and Lithography |
| Yo
Yamamoto, Camille Stebler, Haruo Takahashi, Hidekazu Suzuki,
Koji Iwasaki, Toshiaki Fujii and Michael Rauscher |
SII
NanoTechnology Inc. |
Transmission
electron microscopy sample preparation employing a "triple"
beam instrument * |
| Doewon
Park, Mark E. Twigg, Edward E. Foos, Walter Kruppa, Arthur
W. Snow and Mario G. Ancona |
Naval
Research Laboratory |
Electron-Transparent
Cantilevers for TEM Visualization of Nanodevices * |
|
|
|
|
|
Nanobio Devices
|
|
|
|
| Teresa
Fazio, Mari-Liis Visnapuu, Eric Greene and Shalom Wind |
Columbia
University |
Nanoscale
“Curtain Rods” for the Study of Protein-DNA Interactions
* |
|
|
|
|
|
Patterned
Media/Data Storage
|
| |
|
|
| Geoffrey
W. Burr, Kailash Gopalakrishnan, Rohit S. Shenoy, Charles
T. Rettner and Bulent N. Kurdi |
IBM
Almaden Research Center |
Storage
Class Memory |
| Stuart
Parkin |
IBM
Almaden |
Race
Track Memory |
| Shuaigang
Xiao and Xiaomin Yang |
Seagate
Technology |
>1
Tdot/in.2 Bit Patterned Media Template Fabrication by Directed
Polymer Self-Assembly * |
|
|
|
|
|
Beam
Induced Processing
|
| |
|
|
| W.F.
van Dorp, C.W. Hagen, P. Kruit and P.A. Crozier |
Delft
University of Technology |
1
nm patterning |
| Klaus
Edinger, Nicole Auth; Volker Boegli, Michael Budach, Harald Dobberstein,
Thorsten Hofmann, Michael Joest, Jens Oster |
Carl
lZeiss SMS-NaWoTec GmbH |
Applications
of Focused E-beam Processing |
| Yingfeng
Guan, Jason Fowlkes, Scott Retterer, Michael Simpson and
Philip Rack |
The
University of Tennessee, Knoxville |
Maskless
nanolithography approaches utilizing electron-beam-induced
deposition * |
| Michael
Häffner, Andreas Heeren, Monika Fleischer, Marko Burghard
and Dieter Paul Kern |
University
of Tuebingen |
Catalyst
Patterning for Carbon Nanotube Growth on Elevating Posts
by Self-Aligned Double-Layer Electron Beam Lithography * |
|
|
|
|
|
Maskless
|
| |
|
|
| Paul
Petric and Christopher Bevis |
KLA-Tencor
Corp |
Reflective
Electron Beam Lithography (REBL), a Novel Approach to High
Speed Maskless Ebeam Direct Write Lithography |
| Laurent
PAIN, Beatrice ICARD, Bert Jan Kampherbeek, Gerard Gross,
Christof Klein, Hans Loeschner, Elmat Platzgummer, Ray Morgan,
Serdar Manakli, Johannes Kretz, Christoph Hohle, Kai Choi,
Frank Thrum, Katja Keil and Mathias Irmscher |
CEA-LETI |
The
European “MAGIC” initiative on massively parallel electron
beam lithography - Resist technology status |
| Shinji
Sugatani |
e-Shuttle,Inc. |
Application
and Technology of EBDW (Electron Beam Direct Writing):The
Impact on its Business Circumstances |
| Bert
Jan Kampherbeek |
Mapper
Lithography |
MAPPER:
High Throughput Maskless Lithography |
| Elmar
Platzgummer, Hans Loeschner and Gerhard Gross |
IMS
Nanofabrication AG |
Projection
Mask-Less Patterning (PMLP) for Nanotechnology Applications
|
|
|
|
|
|
New
Nanopatterning
|
| |
|
|
| Stephen
Chou, Wen-Di Li, Xiaogan Liang and Ying Wang |
Princeton
University |
Quantized-Patterning
Using Nanoimprinted-Blanks |
| Christopher
J. Morris |
U.S.
Army Research Laboratory |
Micro-Scale
Self-Assembly Via Capillary Forces |
|
|
|
|
|
Low-Dimensional
Devices
|
|
|
|
Mark
Hersam
|
Northwestern
University
|
Probing
the structure and properties of individual molecules on
silicon surfaces
|
Mihri
Ozkan
|
Univeristy
of California, Riverside
|
Nanopatterning
and Assembly of Electronics |
|
|
|
|
|
Nanoelectronics
|
|
|
|
Thomas
Schenkel
|
LBNL |
Single-atom
doping and single atom device development |
